RADIATION DEFECTS IN LITHIUM FLUORIDE BY VARIOUS IONS

Rastislav Rohožka - Christina Trautmann - Kurt Schwartzz - Vladimír Nečas

   In LiF, the formation of defects upon electronic excitations was studied using various ions with energy I 1.4 MeV/u. The induced damage was revealed by the technique of selective chemical etching. Track etching was only successful in those cases where the linear energy transfer of the ions had surpassed a critical threshold of about 11 keV/nm.

Keywords: alkali halides, ion irradiation, chemical etching, energy loss, damage

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