AN AUTOMATIC MEASUREMENT SYSTEM WITH HALL PROFILING AND A FOUR POINT PROBE FOR CHARACTERIZATION OF SEMICONDUCTORS

Rudolf Kinder - Ladislav Hudec - Marian Blažíček

   This article deals with the design, construction and a control program of an automatic measuring system (AMS). The AMS allows to obtain the carrier concentration profile n(x) and mobility profile μ(x) from the sheet resistance and sheet Hall mobility by van der Pauw measurements, while gradually removing layers of the semiconductor by anodization/etch procedures. AMS can also be used for sheet resistance measurements by the four-point-probe method and for calculating the specific resistance. Further, the software of the AMS contains graphical subroutines for conversion of resistivity to concentration and mobility. The experimental n(x) profile has been compared with that calculated by program SUPREM.

Keywords: Hall system, van der Pauw, Si, four point probe, SUPREM

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