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   FEI STU Bratislava    deGruyter-Sciendo

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[2, 2019] 

Journal of Electrical Engineering, Vol 70, 2 (2019) 171-175 DOI: 10.2478/jee-2019-0025

Formation of nanocrystalline alloys after Cu ions implantation into amorphous precursor

Jozef Sitek – Dominika Holková – Július Dekan – Milan Pavúk – Patrik Novák

   Amorphous precursors of A: (Fe64Co21B15)95P4Cu1 and B: (Fe64Co21BB15)96P4 alloys were used. Nanocrystalline structure was created by heat treatment. Samples were studied by Mössbauer spectroscopy, XRD and AFM. Cu ions of dose 1016 at cm2 were implanted into the amorphous B. According to simulated program we estimated that Cu ions created surface layer with a thickness of a few micrometres. Changes in bulk structure were not observed at parameters of Mössbauer spectra after implantation. After heat treatment the implanted sample was nearly identical with the nanocrystalline sample of A. Implantation had an influence on the volumetric fraction of the constituent phases and on their magnetic microstructure. Implantation of Cu ions in amorphous precursor containing Cu as sample A caused after heat treatment in nanocrystalline state increasing of nanocrystalline component. This technology of preparation of nanocrystalline alloys indicate that implantation of ions into an amorphous precursor has an influence on the final structure and properties of nanocrystalline alloy.

Keywords: base stationamorphous alloys, nanocrystalline alloys, radiation damage, Mössbauer spectroscopy cell, equi-interference lines, environmental propagation coefficient, rings of base stations


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