Graphene prepared on SiC by chemical vapor deposition process at low temperature

Petr Machac

   Graphene preparation by the method of chemical vapour deposition on SiC substrates is described. Despite very low growth temperature (1080 °C) and with use of methane atmosphere, carbon layers in the form of multi-layer graphene were prepared. Graphene quality was verified by means of available analytical methods: Raman spectroscopy, X-ray Photoelectron Spectroscopy, Van der Paw method.

Keywords: graphene, CVD process, SiC

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