advanced
Journal Information
Journal Information
   Description
   Editorial Board
   Guide for Authors
   Ordering

Contents Services
Contents Services
   Regular Issues
   Special Issues
   Authors Index

Links
Links
   FEI STU Bratislava
   SAS Bratislava

   Feedback

[5, 2020] 

Journal of Electrical Engineering, Vol 71, 5 (2020) 359-364 10.2478/jee-2020-0049

Fabrication of nano-patterns of photoresist by ultraviolet lithography and oxygen plasma

E Cheng – Suzhou Tang – Helin Zou – Zhengyan Zhang – Yao Wang

   Nanofluidic devices with twodimensional nanochannels have many applications in biology and chemistry however, it is still a challenge to develop a low-cost and simple method for fabricating nano-masks that can be used to produce two-dimensional nanochannels. In this paper, a novel low-cost and simple method, based on UV lithography and oxygen plasma, was proposed to fabricate nano-mask. The influence of exposure time on the photoresist mesas was investigated in the ultraviolet lithography process. The parameters of RF power and treatment time on the width reduction of photoresist mesas were analyzed by the oxygen plasma. In our work, in order to increase the efficiency controllability of photoresist removal, a RF power of 90 W, a pressure of oxygen plasma 60 Pa, and the time division method were adopted to remove photoresist by oxygen plasma. Finally, nano-patterns of photoresist mesas with bottom width of 330 nm were successfully fabricated. The proposed method provides a low-cost way to produce high-throughput two-dimensional nanochannels.

Keywords: nano-patterns, fabrication, ultraviolet lithography, oxygen plasma


[full-paper]


© 1997-2021  FEI STU Bratislava