STRUCTURAL AND MORPHOLOGICAL INVESTIGATIONS OF TiO2 SPUTTERED THIN FILMS
Ivan Hotový – Andrea Pullmannová – Martin Predanocy – Juraj Hotový – Vlastimil Řeháček – Thomas Kups – Lothar Spiess
TiO2 thin films were prepared by dc reactive magnetron sputtering in a mixture of oxygen and argon on silicon and oxidized silicon substrates. The effect of post-deposition annealing (300, 500 and 700°C for 8h in air) on the structural and morphological properties of TiO2 thin films is presented. XRD patterns have shown that in the range of annealing temperatures from 300 to 500°C crystallization starts and the thin film structure changes from amorphous to polycrystalline (anatase phase). EDX measurements revealed that post-deposition annealing has affected the oxygen concentration in the film very slightly.
Keywords: TiO2 thin films, dc magnetron sputtering, structure, morphological properties