advanced
Journal Information
Journal Information
   Description
   Editorial Board
   Guide for Authors
   Ordering

Contents Services
Contents Services
   Regular Issues
   Special Issues
   Authors Index

Links
Links
   FEI STU Bratislava
   SAS Bratislava

   Feedback

[6, 2013] 

Journal of Electrical Engineering, Vol 64, 6 (2013) 371-375 DOI: 10.2478/jee-2013-0056

PREDICTIVE SYNCHRONOUS GENERATOR EXCITATION CONTROL BASED ON LAGUERRE MODEL

Robert Andok – Anna Benčurová – Pavol Hrkút – Anna Konečníková –
Ladislav Matay – Pavol Nemec – Jaroslava Škriniarová

   In this article we describe the electron-beam direct-write (EBDW) lithography process for the AZ 5214E photoresist which is, besides its sensitivity to UV radiation, sensitive also to electrons. An adapted process flow is provided. At the same time we examine the resistance of this resist to RIE and its suitability as an etch-mask for etching thin Ag layers in N2 plasma. A comparison with several chosen resists (PMMA, ma-2405, ma-N 1402, SU-8 2000) is provided.

Keywords: AZ 5214E resist, PMMA resist, image reversal, EBDW lithography, characteristic curves, RIE, etch-rates


[full-paper]


© 1997-2019  FEI STU Bratislava