Properties of nanocrystalline Si layers embedded in structure of solar cell

Stanislav Jurečka – Kentaro Imamura – Taketoshi Matsumoto – Hikaru Kobayashi

   Suppression of spectral reflectance from the surface of solar cell is necessary for achievement of high energy conversion efficiency. We developed simple method of forming of nanocrystalline layers with ultralow reflectance in a broad interval of wavelengths. The method is based on metal assisted etching of silicon surface. In this work we prepared Si solar cell structures with embedded nanocrystalline layers. The microstructure of embedded layer depends on the etching conditions. We examined the microstructure of etched layers by the transmission electron microscope and analysed experimental images by statistical and Fourier methods. Obtained results provide information sensitive to applied treatment operations and can be used for optimization of the solar cell forming procedure.

Keywords: semiconductor, silicon solar cell, microstructure, Fourier analysis

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